Integrated Scratch Marker for Wafer Defect Diagnosis
编号:69 访问权限:仅限参会人 更新:2021-08-23 14:35:52 浏览:401次 口头报告

报告开始:2021年08月20日 21:25(Asia/Shanghai)

报告时间:20min

所在会场:[SS] Special Session [SS4] A6. Test Methods Towards Zero Failure Rate for Safety-Critical ICs

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摘要
The scratch defect type is difficult to recognize because the position, shape, size and curvature vary widely from one scratch to another. Discontinuity points within scratches also contribute to the low recognition rate, and such points are often hidden defective dies that become reliability threat. The recognition rate for scratches is among the lowest in all patterns even if the overall accuracy is high. In this paper, we propose a novel scratch pattern recognition method.
The method is validated by real products. Experimental results show that the average recall, precision and accuracy achieved by the proposed method are 97.22%, 98.81%, and 99.92%, respectively. Furthermore, the proposed method is based on image processing techniques alone with low processing time. In contrast to machine-learning based methods, there is no need to train a complicated prediction model.
关键词
scratch defect;wafer map;wafer test
报告人
Katherine Shu-Min Li
National Sun Yat-Sen University

Katherine Shu-Min Li (S’04, M’06, S. M' 13-now) received the B.S. degree from Rutgers University, New Brunswick, NJ, and the M.S. and Ph.D. degrees from National Chiao  Tung University,  Hsinchu,  Taiwan, in 2001 and 2006, respectively. She is currently a Full Professor with the Department of Computer Science and Engineering, National Sun Yat-Sen University, Kaohsiung, Taiwan.
Her current  research  interests  include  Interposer Test, 2.5D/3D/SiP IC Test, Microfluidic Chip Synthesis & Test, Hardware Security & Trojan, Side Channel Effect, Design for Security (DfS), Machine Learning, Big Data, Crosstalk  Effects,  Signal & Power Integrity, SOC testing, Floorplanning and Routing for Testability and Yield Enhancement, Design for Yield (DfX), Scan  Reordering, Scan  Routing,  Low-Power  Scan  Techniques, particularly on Oscillation Ring Test Schemes, and Interconnect Optimization. Her recent researches involve also in cross-field exploration in research field of IC Design & Test (D&T), Electronics Design Automation & Test (EDA&T), Computer Integrated Manufacturing (CIM), Computer Aided Design (CAD) and Computer Aided Engineering (CAE) in Factory Automation (Industry 4.0), especially High Frequency Trading (HFT) in FinTech.
Dr.  Li  is  a  member  of  IEEE Education and IEEE  Circuits   and  Systems Society, Association for Computing Machinery (ACM), and ACM Special Interest Group on Design Automation, IEEE Women in Engineering (WIE) (Oct. 13-now).

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重要日期
  • 会议日期

    08月18日

    2021

    08月20日

    2021

  • 05月10日 2021

    初稿截稿日期

  • 08月16日 2021

    提前注册日期

  • 08月19日 2021

    报告提交截止日期

  • 08月20日 2021

    注册截止日期

主办单位
IEEE
Tongji University
Chinese Computer Federation
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Tongji University
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