International and domestic semiconductor companies have been making major investments in China. This is the motivation behind to organize this Workshop as a first of its kind in China. IWAPS provides a forum for the experts from industry and research institutions worldwide to present and discuss advanced pattering solutions and related challenges such as material, equipment, process, metrology, computational lithography and design optimization.
The speakers at the workshop are selected by invitation only and represent a broad range of disciplines and covering a wide array of different lithography approaches and requirements. Presentations are arranged to be comprehensive, covering the current practice, the future trends and the challenges ahead. The workshop is intended to provide a platform for attendees from international and domestic institutions to interact and discuss some common challenges faced by the industry. It will also be an opportunity for people to learn more about the semiconductor R&D and business landscape in China.
Abstract Instructions
The abstract must clearly describe the nature, scope, content, organization, key points and significance of the proposed paper.
The ABSTRACT must include paper title, key words, author name, affiliation and full contact information (email and address). The Word of Abstract limit is up to 500 words. Introductory paragraph describing the intended content of your conference is a huge plus to your papers. Graphs are highly encouraged in the submitted abstract.
Full Text
After the abstract is accepted, the author needs to submit the final paper in accordance with the requirements of the full-text template. The full text of the paper must be limited to 4 pages. Please send your final paper in Word and PDF version to iwaps_program@ime.ac.cn before the deadline.
Papers of this conference will be submitted to IEEE Xplore and EI for examination. Please be sure to submit the full text before the deadline. Otherwise, it will not be submitted for examination. Please refer to the template format. The full text is limited to 4 pages.
If the full text is longer than four pages, we suggest submitting the full text version that meets the requirements of the conference and the long text version at the same time. We will recommend the long text version to the Journal of Microelectronic Manufacturing when the full text version is submitted to IEEE Xplore and EI. We also welcome authors to contribute to JOMM after expanding the theoretical or experimental content of the full text of the conference.
Presentation Instructions
For oral presenters:
Authors of papers selected for oral presentation shall attend IWAPS 2022 and give a 15 minutes technical overview presentation about your paper. Speakers are responsible for providing a PPT in advance to be uploaded for presentation at the conference. The PPT Due is September 30th 2022. Please send PPT to iwaps_program@ime.ac.cn before the due date.
For poster presenters:
(to be updated).
Scope of IWAPS Paper
IWAPS is devoted to publishing research on the cutting-edge microelectronic manufacturing technology. The scope of the conference covers studies of advanced semiconductor manufacturing sciences and technologies from early stage theories and experiments to industrial high volume manufacturing applications. The perspective scope includes, but is not limited to the following areas:
i. Optical Lithography
ii. Extreme Ultraviolet (EUV) Lithography
iii. Advanced Patterning Technologies
iv. Metrology, Inspection and Testing
v. Design and Technology Co-optimization and Design for Manufacturability
vi. Materials
vii. Process
10月21日
2022
10月22日
2022
摘要截稿日期
注册截止日期
2024年10月15日 中国 Jiaxing
国际先进光刻技术研讨会2024年05月17日 中国 中国光谷科技会展中心
2024先进光刻技术研讨会2024年05月17日 中国 光谷科技会展中心
2024先进光刻技术研讨会2023年10月26日 中国 Lishui
2023 International Workshop on Advanced Patterning Solutions2022年10月22日 中国 Beijing
第六届国际先进光刻技术研讨会2021年12月12日 中国 Foshan
2021 International Workshop on Advanced Patterning Solutions
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