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AboutComponents, Circuits, Devices and Systems; Computing and Processing; Engineered Materials, Dielectrics and Plasmas; Engineering Profession; Photonics and Electrooptics
Keywords:Lithography,EUV,Metrology,Inspection,Testing,Design for Manufacturability,Design and Technology Co-optimization,Materials,Device,Process Technologies,
Scope:IWAPS is devoted to publishing research on the cutting-edge microelectronic manufacturing technology. The scope of the conference covers studies of advanced semiconductor manufacturing sciences and technologies from early stage theories and experiments to industrial high volume manufacturing applications. The perspective scope includes, but is not limited to the following areas: i. Optical Lithography ii. Extreme Ultraviolet (EUV) Lithography iii. Advanced Patterning Technologies iv. Metrology, Inspection and Testing v. Design and Technology Co-optimization and Design for Manufacturabilityvi. Materials vii. Device viii. Process
Sponsor Type:3; 3; 9; 9; 9; 9; 9
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重要日期
  • 会议日期

    12月12日

    2021

    12月13日

    2021

  • 12月13日 2021

    注册截止日期

主办单位
Chengdu Section China Integrated Circuit Innovation Alliance Chinese Optical Society - COL Guangzhou Section Inst. of Microelectronics of the Chinese Academy of Sciences - IMECAS Institute of Optics and Electronics, Chinese Academy of Sciences Nanjing Chengxin Institute of IC Technology
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