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活动简介
The 14th International Workshop on Junction Technology (IWJT2014) will be held on May 18 - 20, 2014 in Shanghai, China. The IWJT, started in 2000 and was held annually in Japan or China, is an open forum focused on the needs and interest of the community of a junction formation technology in semiconductors. At the past IWJTs, a number of eminent and experienced scientists and engineers from Asia, America, and Europe presented their latest results on junction technology. The workshop will provide a good opportunity for researchers and engineers to present their new research results, and exchange ideas with leading scientists in this field.
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重要日期

2014-03-03
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征稿范围

Workshop Scope (Papers are solicited in, but not limited to the following) Doping Technology --- Ion implantation, plasma doping, gas and solid doping Annealing Technology --- Rapid thermal process, laser annealing, flash annealing, SPE, lattice damage
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重要日期
  • 会议日期

    05月18日

    2014

    05月20日

    2014

  • 03月03日 2014

    摘要截稿日期

  • 05月20日 2014

    注册截止日期

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