活动简介

The growing complexity and shrinking geometries of modern manufacturing technologies are making high-density, low-voltage devices increasingly susceptible to the influences of electrical noise, process variation, transistor aging, and the effects of natural radiation. The system-level impact of these errors can be far-reaching. Growing concern about intermittent errors, unstable storage cells, and the effects of aging are influencing system design and failures in memories account for a significant fraction of costly product returns. Emerging logic and memory device technologies introduce several reliability challenges that need to be addressed to make these technologies viable. Finally, reliability is a key issue for large-scale systems, such as those in data centers. The SELSE workshop provides a forum for discussion of current research and practice in system-level error management. Participants from industry and academia explore both current technologies and future research directions (including nanotechnology). SELSE is soliciting papers that address the system-level effects of errors from a variety of perspectives: architectural, logical, circuit-level, and semiconductor processes. Case studies are also solicited.

征稿信息

重要日期

2017-01-06
摘要截稿日期
2017-01-06
初稿截稿日期
2017-02-20
初稿录用日期
2017-03-01
终稿截稿日期

征稿范围

  • Technology trends and the impact on error rates.

  • New error mitigation techniques.

  • Characterizing the overhead and design complexity of error mitigation techniques.

  • Case studies describing the tradeoffs analysis for reliable systems.

  • Experimental silicon failure data.

  • System-level models: derating factors and validation of error models.

  • Error handling protocols (higher-level protocols for robust system design).

  • Characterization of reliability of systems deployed in the field and mitigation of issues.

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重要日期
  • 会议日期

    03月21日

    2017

    03月22日

    2017

  • 01月06日 2017

    摘要截稿日期

  • 01月06日 2017

    初稿截稿日期

  • 02月20日 2017

    初稿录用通知日期

  • 03月01日 2017

    终稿截稿日期

  • 03月22日 2017

    注册截止日期

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IEEE
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