746 / 2022-03-31 20:34:56
Surface Diacharge and Its Residual Charge Accumulaiton Characteristics in C4F7N/CO2 Under Negative Impulses
surface discharge,charge accumulation,C4F7N/CO2,impulse voltage
摘要录用
Junhong Chen / State Key Laboratory of Electrical Insulation and Power Equipment;Xi'An Jiaotong University
Junhao Dong / State Key Laboratory of Electrical Insulation and Power Equipment; Xi’an Jiaotong University
Jinshu Li / State Key Laboratory of Electrical Insulation and Power Equipment; Xi’an Jiaotong University
Peng Sun / Xi'an Jiaotong University;State Key Laboratory of Electrical Insulation and Power Equipment
军波 邓 / 西安交通大学;State Key Laboratory of Electrical Insulation and Power Equipment
Guan-Jun ZHANG / Xi'an Jiaotong University
Many investigations have been carried out on C4F7N gas and its mixtures. However, the in-deep studies on the fundamental surface discharge characteristics of C4F7N/CO2 mixtures are still scarce. Therefore, an investigation on surface discharge propagation and its residual charge distribution of C4F7N/CO2 mixtures under negative impulses is conducted and analyzed.

Epoxy resin sheet is fixed on an insulating bracket with needle and plate electrodes to forming an electrode-sample configuration. The discharge image under negative impulse is captured by an ICCD camera, the discharge voltage signal is recorded by a resistance divider and the current signal is measured by a current sensor. After discharge, the dust figure is manufactured.

The surface discharge images and dust figures of C4F7N/CO2 mixtures shows that the surface discharge in C4F7N/CO2 mixture have more branches than CO2 and SF6. The backward discharge pattern could be found in current signal and dust figure. The residual charge distribution indicates that the propagation of surface discharge in C4F7N/CO2 mixture is following a stepwise expansion development pattern.

The propagation pattern of surface discharge in C4F7N/CO2 mixture is different from that in CO2 and SF6, which results in the difference in surface flashover properties.
重要日期
  • 会议日期

    09月25日

    2022

    09月29日

    2022

  • 08月15日 2022

    提前注册日期

  • 09月10日 2022

    报告提交截止日期

  • 11月10日 2022

    注册截止日期

  • 11月30日 2022

    初稿截稿日期

  • 11月30日 2022

    终稿截稿日期

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IEEE DEIS
承办单位
Chongqing University
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