第十一届X光/ EUV光学组件进展国际会议 Advances in X-Ray/EUV Optics and Components XI

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活动简介

Expanding use of x-ray and EUV radiation in many scientific and technical applications requires the continued development of new and improved sources and optics to deliver brighter, better-conditioned beams to the end-user. This conference focuses on the advances, as well as the emerging needs, in x-ray and EUV sources, optics, and applications including next-generation synchrotron sources, EUV photolithography, and x-ray astronomy. In radiation to sources and source/optics integration, the topics covered include design, development, fabrication, installation, evaluation, and applications of optical elements such as mirrors, monochromators, multilayers, zone-plates, and lenses. It is also an aim of this conference to provide an opportunity for the developers and users to share both the progress and challenges in each of these and related areas.

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Presentations on emerging needs, progress reports, and topical reviews covering the following and related topics are solicited:

x-ray sources (synchrotron, XFEL, etc...)
emerging needs in x-ray, XFEL, and EUV optics
novel optical substrates, materials, processes, and applications
crystal optics design, fabrication, and applications
x-ray and EUV mirror fabrication: surface figuring and finishing techniques, capabilities, and limitations
management of optical components under high heat/radiation load and in hostile environments
thermal and mechanical stability of optical systems
active/passive/adaptive shape control of optical elements
coherence preservation and wave front quality
coating- and multilayer-based optics and performance
focusing optics including refractive, reflective, and diffractive optics
filters, windows, x-ray beam position monitors
x-ray optics for extreme spatial and / or energy resolution
x-ray optics software and simulation.