The 25th Symposium on Photomask and NGL Mask Technology

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活动简介

Photomask Japan 2018 is the 25th international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.

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征稿范围

Materials for Photomasks
Fabrication Process Steps and Equipments for Photomasks (developing, etching, cleaning etc.)
Photomask Writing Tools and Technologies including multi-beam EB writer
Tools and Technologies for Metrology/Inspection/Repair
Technologies and infrastructures for EUVL masks
Technologies and infrastructures for NIL masks
Technologies and infrastructures for FPD masks
Mask Data Preparations, EDA and DTCO
Photomasks with RET: PSM, OPC, SMO and Multiple Patterning
Photomask-related Lithography Technologies
DSA (Directed Self-Assembly) related mask technologies
Strategies and Business Challenges: Cost, Cycle-Time, ML2 etc.
Mask/Lithography related Technology in Academia (Poster Session)