The 2017 International Symposium on VLSI Technology, Systems and Applications (2017 VLSI-TSA) will be held on April 24-27, 2017 at the Ambassador Hotel Hsinchu,Taiwan. Organized by Industrial Technology Research Institute (ITRI) and technically co-sponsored by IEEE, VLSI-TSA is proud to create an annual platform for technical exchanges by experts from all over the world on the advancements in semiconductor research, development, and manufacturing.
VLSI-TSA, conjoined with International Symposium on VLSI Design, Automation and Test (VLSI-DAT), has been the premier event on VLSI in Taiwan and a leading technology conference in the world for over 30 years.
Join us at VLSI-TSA technical programs as well as experience historic Hsinchu city, in which the technical and cultural atmosphere have been harmoniously connected.
Low power CMOS and embedded memory
Foundry technology
RF process, device and integration technology
Standalone memory: DRAM, FLASH, emerging memory technology
Advanced process modules: e.g. gate stack, junction, strain/channel engineering, low-R contact, low-C spacer/ILD,interconnect technology, ALE and selective deposition, etc.
Nanopatterning: Multiple patterning, Directed Self-Assembly, EUV, etc.
Power and analog IC device and technology
Advanced CMOS process and devices: Ge, SiGe, III-V, FinFET, GAA, 2D materials/1D nanowires
Material, Process and device modeling
TFT and organic electronics
MEMS, imagers and sensors
Advanced manufacturing technology, metrology and yield
Reliability physics, characterization and test
Advanced packaging and 2.5D/3D Integration
Photonics and Beyond CMOS Technology
Energy harvesting technology
Wearable and loE enabling technologies
04月24日
2017
04月27日
2017
初稿截稿日期
初稿录用通知日期
注册截止日期
2013年04月22日 台湾-中国
2013年超大规模集成电路技术系统和应用国际研讨会
留言