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活动简介

Symposium VI: Metrology, Reliability and Testing

Metrology

  • Applications to ICs, thin film heads, systems-on-a-chip, and thin film

  • Device manufacturing

  • Breakthroughs and advancements in electron/Ion microscopy calibration and accuracy

  • Critical dimension metrologies

  • Defect detection, analysis, and control

  • Limits of metrology and inspection systems

  • Mask related metrology

  • Measurement system modeling and simulation

  • Metrology and inspection methodologies

  • Overlay, registration, and alignment metrologies

  • Process control, characterization, and yield enhancement

Reliability

  • 3D IC reliability

  • Back-End Reliability

  • Front-End Reliability

  • Memory

  • MEMS reliability

  • Middle of Line Reliability

  • Nano-electronic device reliability

  • Package/assembly reliability

  • Product reliability and burn-in

  • Reliability in designs and circuits

  • Reliability in device and process

  • Reliability in interconnects

  • Reliability qualification strategies

Test

  • 2.5D, 3D and SiP Test

  • Analog/Mixed-Signal/RF Test

  • ATE hardware and software

  • ATPG, test synthesis

  • Design-for-Test: chip, board, system

  • Design and test for reliability

  • Diagnostics

  • Hardware Security

  • IDDQ and current test

  • Memory test

  • Microprocessor Test

  • Power issues in test

  • System-on-Chip test

  • System-in-Package test

  • Test and design for manufacturability

  • Test for nanometer technologies

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重要日期
  • 会议日期

    03月12日

    2017

    03月13日

    2017

  • 03月13日 2017

    注册截止日期

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