活动简介

BALD 2016 will provide possibilities to publish results of recent studies on atomic layer deposition (ALD) and to initiate and support collaboration between research groups working in this field and applications: from advanced electronics, microsystems, and displays to energy capture and storage, solid state lighting, biotechnology, security, and consumer products - particularly for any advanced technologies that require control of film structure in the nanometer or sub-nanometer scale.

征稿信息

重要日期

2016-07-08
初稿截稿日期

征稿范围

  • Metals, nitrides, carbides; 
  • Microelectronic applications; 
  • Reaction mechanisms; 
  • Process development;
  • Energy applications;
  • Micro- and nanosystems, physics and technology;
  • Characterization;
  • Hybrid materials.
留言
验证码 看不清楚,更换一张
全部留言
重要日期
  • 会议日期

    10月02日

    2016

    10月04日

    2016

  • 07月08日 2016

    初稿截稿日期

  • 10月04日 2016

    注册截止日期

主办单位
IEEE
联系方式
移动端
在手机上打开
小程序
打开微信小程序
客服
扫码或点此咨询