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活动简介

This conference will cover a timely focused topic in the symposium on "Organic Photonics + Electronics" that is centered on the science and technology of next generation memory and logic devices based on organic, hybrid organic/inorganic, and inorganic materials, which are predominately fabricated by printing technologies. The conference will span a broad spectrum from the fundamental science related to novel materials development and processing to addressing issues related to organic and inorganic surfaces and interfaces, to device fabrication and integration using novel printing methods. The aim of the meeting is to gather an interdisciplinary audience and researchers from the chemistry, materials science, bioelectronics, physics, applied science and engineering communities working on basic and applied research motivated by newly emerging technologies on printed memory and logic. 

 

In this year’s conference a special emphasis will be given to organize joint sessions on neuromorphic and bioelectronics applications jointly with the "Organic Semiconductors in Sensors and Bioelectronics" conference, as well on printed organic and hybrid TFT technology with the “Organic Field-Effect Transistors“ conference. 

征稿信息

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The scope of the conference will cover but is not limited to the following areas:

·organic, hybrid organic/inorganic, and inorganic materials based memory devices

·memristor, ferroelectric, and charging based device concepts

·switching mechanisms in memristors

·interface energetics in hybrid memory and bioelectronic materials and devices

·crossbar addressing and memory arrays

·smart memory devices

·neuromorphic and bioelectronics applications

·organic, hybrid organic/inorganic, and inorganic materials based logic devices

·inverters, logic gates, ring-oscillators, AD converters

·RFID applications and smart integrated systems

·emerging materials for printed electronic applications

·photonic curing processes in printed electronic applications

·large-area S2S and R2R fabrication techniques

·high resolution S2S and R2R fabrication techniques

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重要日期
  • 会议日期

    08月28日

    2016

    09月01日

    2016

  • 09月01日 2016

    注册截止日期

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