Presentations for this symposium are being solicited for the following EUVL topics, with a strong preference for contributions discussing HVM introduction and EUVL extendibility. · Exposure tools (ET) · Source-collector module (SO) · Masks (MA) · Resists and materials (RE) · Resist outgassing and contamination (OC) · Metrology and inspection (MI) · Processes enhancing EUV (PE)