Advanced optical metrology techniques including interferometry and related optical techniques allow for non-contact inspection of a wide range of objects from macro- to nano-scale and on surfaces from super-polished to structured or randomly rough. The continuous development of new methods and algorithms both in the laboratory and for industrial applications has greatly refined the science of optical measurements and instruments. More and more of the information that photons can carry is being used, from phase to wavelength and polarization, to spatial and temporal coherence. Today, research laboratories, industrial manufacturing, and standardization institutes rely on the precision, reliability and flexibility of these techniques, and new applications are rapidly being developed. Two exciting technical conferences are offered in this Interferometry series: Techniques and Analysis, and Applications. The conferences will cover the latest advances in all areas of interferometry and fringe processing. Recent progress and next-generation developments will be highlighted. The organization of the two interferometry conferences will be coordinated to avoid parallel sessions/short courses/posters and to allow time for visiting the exhibition. Please submit your oral or poster paper(s) to the conference(s) of your choice.