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Nanomanufacturing is the essential bridge between nanoscience and real world nanotech products. In this rapidly developing field, a broad spectrum of products that will affect virtually every industrial sector is emerging. In order to achieve the broad impacts envisioned, nanotech products must be manufactured in market-appropriate quantities in a reliable, repeatable, and commercially viable manner. In addition, they must be manufactured so that environmental and human health concerns are met, worker safety issues are appropriately assessed and handled, and liability issues are addressed. Critical to this realization of robust nanomanufacturing is the development of appropriate instrumentation, metrology, and standards. As novel applications emerge, the demand for highly sensitive and efficient metrology tools with capability of rapid and thorough coverage of large functional areas is emerging. This includes the fast and area-covering measurement of properties such as nanoroughness, flatness and figure, thin film structure, and nano-particle contamination. Furthermore, for the development of nanostructured surfaces with specific functionalities (e.g. self-cleaning, tribological effects), a tight link between measurement and modeling tool becomes essential. The multidisciplinary character of the conference provides a forum to present and discuss the newest developments of metrology techniques as well as industrial needs for new measurement equipment and reference materials. The measurement principles include e.g. scanning-probe microscopy, optical microscopies and profilometry, light scattering methods, SEM-based metrology, ellipsometry, reflectometry, interferometry and nanoparticle characterization instrumentation. If a nano-enabled product cannot be measured, it cannot be manufactured; additionally if that product cannot be made safely it also should not be manufactured. The Instrumentation, Metrology, and Standards for Nanomanufacturing will become the leading forum for the exchange of foundational information and discussion of the essential instrumentation, metrology and standards required for nanomanufacturing. This conference welcomes original technical papers on these and other relevant topics. Criteria for abstract peer review and rating will include contribution to scientific understanding, relevance and interest to the nanomanufacturing community, and lack of advertisements. Submitted papers must concentrate on the underlying technologies and methods, not on product marketing.
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重要日期

2014-02-03
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Consistent with the SPIE conference charter and goals, please, submit the technical papers in the broad technology areas listed below: nanomanufacturing methodologies metrology and inspection methodologies high resolution optics, including full-field, nea
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重要日期
  • 会议日期

    08月17日

    2014

    08月21日

    2014

  • 02月03日 2014

    摘要截稿日期

  • 08月21日 2014

    注册截止日期

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