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The World's Leading Symposium on Lithography and Nanofabrication EIPBN, the “3-Beams”, Conference, is the premier conference on the science and technology of nanopatterning. Traditionally focused on electron, ion, and photon beams, (the 3 beams), the technology of nanofabrication covered in this conference has grown to include nanoimprint and molecular self-assembly as well. This conference is the place to hear the newest techniques and the latest advances in patterning and device fabrication technology.
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Abstracts representing high quality original research are desired for both poster and oral presentation in the following areas: Extreme UV lithography Electron and ion beam lithography Advanced optical lithography Metrology and imaging Resists and resist
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重要日期
  • 会议日期

    05月28日

    2013

    05月31日

    2013

  • 05月31日 2013

    注册截止日期

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美国物理协会
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