The World's Leading Symposium on Lithography and Nanofabrication
EIPBN, the “3-Beams”, Conference, is the premier conference on the science and technology of nanopatterning. Traditionally focused on electron, ion, and photon beams, (the 3 beams), the technology of nanofabrication covered in this conference has grown to include nanoimprint and molecular self-assembly as well. This conference is the place to hear the newest techniques and the latest advances in patterning and device fabrication technology.
征稿信息
征稿范围
Abstracts representing high quality original research are desired
for both poster and oral presentation in the following areas:
Extreme UV lithography
Electron and ion beam lithography
Advanced optical lithography
Metrology and imaging
Resists and resist
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