Meihua Liu / Peking University Shenzhen Graduate School
Kuanchang Chang / Peking University Shenzhen Graduate School
Xinnan Lin / Peking University Shenzhen Graduate School
Lei Li / Peking University Shenzhen Graduate School
Yufeng Jin / Peking University Shenzhen Graduate School
In this paper, we introduced ions into GaN HEMTs by supercritical treatment to suppress the positive shift in threshold voltage. After treatment, threshold voltage drifts (△Vth) under forward gate bias stress decreased from 4.05V to 0.15V, gate leakage current was reduced to 5×10-11A/mm. It was suggested that nitrogen ions could modify interface state traps with a broad distribution of trapping, leading to suppressed gate leakage current and threshold voltage drifts.