Since being first introduced more than thirty years ago, microwave on-wafer probes and the related on-wafer measurements have made significant advances. For example, the most recent development of probes makes on-wafer measurement possible at terahertz frequencies and in nanoscale at microwave frequencies. The evolution of on-wafer technology has truly contributed to the development of semiconductor industry. Although it has become a prerequisite to scientific research and industry, on-wafer measurement still has many problems that have not been solved, or even properly identified - for example the higher order modes generated when probing devices during probe calibration and actual device measurement. Other parasitic modes may result from substrates and surrounding circuits. Nevertheless the parasitic modes have significant effect on the accuracy of measurement, especially at higher frequencies such as millimeter-wave frequencies and above.

This workshop will review the challenges of on-wafer measurements including some of the recent progress on modelling, identification and suppression of parasitic modes in on-wafer measurements by a range of experts from different research institutes and industries. It is expected that by the end of the workshop all participants will have better understanding about parasitic modes and will have learned how to identify and suppress higher-order modes so that they can make more accurate and reliable on-wafer measurements. The agenda of the workshop is as follows.