148 / 2021-04-18 10:21:30
Light-Illumination-Induced Degradation in Elevated-Metal Metal-Oxide Thin-Film Transistors without and with Fluorination
EMMO,thin-film transistors,light illumination stress
终稿
Siting Chen / Shenzhen University
Meng ZHANG / Shenzhen University
Zhiying Chen / Shenzhen University
Yuyang Yang / Shenzhen University
Lei Lu / Peking University
Yan Yan / Shenzhen University
Man Wong / Hong Kong University of Science and Technology
Juin J. Liou / Shenzhen University
Hoi-Sing Kwok / Hong Kong University of Science and Technology
Light-illumination-induced degradation in elevated-metal metal-oxide (EMMO) thin-film transistors without and with fluorination (F) is characterized and studied. EMMO TFTs shows little degradation under red light illumination stress (LIS) and shows a positive shift of the transfer curve under green and blue LISes. Positive charge generation and metastable defect state generation may be responsible for the LIS-induced degradation. Compared to EMMO TFTs without F, EMMO TFTs with F exhibit better reliability under LIS due to the reduction of oxygen vacancies by the formation of fluorine-metal bonds. The saturation behaviors and recovery behaviors may be due to the an immediate reduction of the donor-like states after the removal of LIS.

 
重要日期
  • 会议日期

    07月10日

    2021

    07月12日

    2021

  • 05月10日 2021

    初稿截稿日期

  • 07月06日 2021

    注册截止日期

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