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Research on the discharge characteristics of repetition-frequency electrodeless Z-pinch
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更新：2026-04-29 14:24:43 浏览：1次
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摘要
Currently, the main technical routes for extreme ultraviolet (EUV) light sources used in lithography research include laser-produced plasma (LPP) light sources and discharge-produced plasma (DPP) light sources. Among DPPs, the inductive electrodeless Z-pinch light source developed by Energetiq is a preferred medium power EUV source technical route due to its electrodeless structural design, which avoids electrode ablation and extends the lifespan of optical components [1].
The fundamental principle of inductive electrodeless Z-pinch is to generate plasma by breaking down low-pressure fuel gas through an induced electric field. The plasma current then drives high repetition-frequency Z-pinch to produce medium power EUV radiation. Therefore, it is necessary to understand the discharge characteristics of inductive high repetition-rate Z-pinch, in order to better design the induction structure and operating conditions of the device based on the expected output parameters.
Based on the structure of the electrodeless Z-pinch EUV light source designed by Energetiq, an inductive repetitive Z-pinch discharge device was made. Different operating conditions were altered to study the discharge characteristics of inductive repetitive Z-pinch. The operating conditions studied included applied voltage, ambient pressure, frequency, and gas filling flow rate.
[1] Horne, S.F., Besen, M.M., Smith, D.K., Blackborow, P.A., and D'Agostino, R.: ‘Application of a high-brightness electrodeless Z-pinch EUV source for metrology, inspection, and resist development.’, Proc Spie, 2006, 6151
The fundamental principle of inductive electrodeless Z-pinch is to generate plasma by breaking down low-pressure fuel gas through an induced electric field. The plasma current then drives high repetition-frequency Z-pinch to produce medium power EUV radiation. Therefore, it is necessary to understand the discharge characteristics of inductive high repetition-rate Z-pinch, in order to better design the induction structure and operating conditions of the device based on the expected output parameters.
Based on the structure of the electrodeless Z-pinch EUV light source designed by Energetiq, an inductive repetitive Z-pinch discharge device was made. Different operating conditions were altered to study the discharge characteristics of inductive repetitive Z-pinch. The operating conditions studied included applied voltage, ambient pressure, frequency, and gas filling flow rate.
[1] Horne, S.F., Besen, M.M., Smith, D.K., Blackborow, P.A., and D'Agostino, R.: ‘Application of a high-brightness electrodeless Z-pinch EUV source for metrology, inspection, and resist development.’, Proc Spie, 2006, 6151
关键词
EUV,electrodeless Z-pinch
报告人
Hongyu Jia
在读博士生 清华大学稿件作者
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重要日期
-
05月12日
2026
会议日期
-
04月15日 2026
初稿截稿日期
主办单位
等离子体物理全国重点实验室
厦门大学
厦门大学
联系方式
历届会议
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2025年05月12日 中国 西安市
第八届极端条件下的物质与辐射国际会议 -
2024年05月13日 中国 Hangzhou
第七届极端条件下的物质与辐射国际会议 -
2023年06月05日 中国 Zhuhai
第六届极端条件下的物质与辐射国际会议 -
2020年05月25日 中国 Xi'an
第五届极端条件下的物质与辐射国际会议 -
2019年05月29日 中国 Hefei
第四届极端物质与辐射国际会议 -
2017年06月01日 中国 Beijing,China
第二届极端物质与辐射国际会议
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