摘要详情

ID / 提交时间

129 / 2026-03-31 10:09:51

标题

Research on the discharge characteristics of repetition-frequency electrodeless Z-pinch

关键字

EUV,electrodeless Z-pinch

主题及专题

激光与脉冲功率技术 > 脉冲功率技术

状态

摘要录用

作者

Hongyu Jia / 清华大学

Xiaobing Zou / 清华大学

Longkun Hong / 清华大学

摘要

Currently, the main technical routes for extreme ultraviolet (EUV) light sources used in lithography research include laser-produced plasma (LPP) light sources and discharge-produced plasma (DPP) light sources. Among DPPs, the inductive electrodeless Z-pinch light source developed by Energetiq is a preferred medium power EUV source technical route due to its electrodeless structural design, which avoids electrode ablation and extends the lifespan of optical components [1].

The fundamental principle of inductive electrodeless Z-pinch is to generate plasma by breaking down low-pressure fuel gas through an induced electric field. The plasma current then drives high repetition-frequency Z-pinch to produce medium power EUV radiation. Therefore, it is necessary to understand the discharge characteristics of inductive high repetition-rate Z-pinch, in order to better design the induction structure and operating conditions of the device based on the expected output parameters.

Based on the structure of the electrodeless Z-pinch EUV light source designed by Energetiq, an inductive repetitive Z-pinch discharge device was made. Different operating conditions were altered to study the discharge characteristics of inductive repetitive Z-pinch. The operating conditions studied included applied voltage, ambient pressure, frequency, and gas filling flow rate.

[1] Horne, S.F., Besen, M.M., Smith, D.K., Blackborow, P.A., and D'Agostino, R.: ‘Application of a high-brightness electrodeless Z-pinch EUV source for metrology, inspection, and resist development.’, Proc Spie, 2006, 6151