69 / 2020-03-23 13:49:12
A Full-region Model for Ultra-Scaled MoS2 MOSFET Covering Direct Source-Drain Tunneling
monolayer MoS2,MoS2 transistor,transistor model,short-channel effects,direct S/D tunneling
终稿
Weiran Cai / Shenzhen University
Wenrui Lan / Shenzhen University
Zichao Ma / University of Science and Technology
Mansun Chan / University of Science and Technology
Lining Zhang / Shenzhen University
A full-region model for ultra-scaled monolayer MoS2 MOSFETs is reported in this work. The electrostatic potential in the scaled transistor structure is analyzed based on a first-principle verified potential model. A continuous full region current model is then developed to capture the short channel effects. Based on the potential model, the barrier height and width for direct source-drain tunneling are obtained. The direct tunneling module reproduces the essential physics observed from numerical device simulations. After integration with the thermionic emission model, the full-region current model is implemented into a SPICE simulator and the model convergence is verified by simulating typical circuits.
重要日期
  • 会议日期

    07月10日

    2021

    07月12日

    2021

  • 05月10日 2021

    初稿截稿日期

  • 07月06日 2021

    注册截止日期

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长沙理工大学
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IEEE Electron Devices Society
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